Who we are
HTP HiTech Photopolymere AG was founded as an "Aktiengesellschaft" under Swiss law in 1997. The three members as a team profit from many years of experience in the field of photochemistry and its use in developing, manufacturing and marketing liquid photoresist materials. This know how can be made available to our customers for the smooth implementation of photoimaging technology, the timely optimization of production processes and fair evaluation of new manufacturing methods.

Our products
HTP is focussed on the development of advanced, liquid photoresist formulations. These resists find their use in the production of PWB innerlayers, etched metal sheet parts and electroformed micromechanical devices. The resists are offered for all commonly used application techniques, such as roller- , dip-, spray- and spin-coating.