| Date |
Occasion/Journal
Title |
Presented by |
| 2004 |
PCMI Journal No. 92, March 2004
"Liquid
Resists for Photo Chemical Machining"
|
HTP AG |
| 2003 |
MicroElectronic Engineering 67-68(2003) 259-265
"A
novel thick photoresist for microsystem technology"
|
Ph. Niedermann, H. Berthou, S. Zwickel, U. Schönholzer,
K. Meier, Ch. Gantner, D. Kapp-Schwoerer
|
| 2003 |
PCMI Journal No. 91, December 2003
"Photoelectropolishing
of stainless steel"
|
M. Buhlert, K. Meier, P.J. Plath |
| 2000 |
PCMI Journal No. 77, June 2000
"Roller-coating
application of liquid photoresist (part I)"
|
HTP AG |
| 1999 |
PCMI Meeting,Providence RI, USA
"Roller-coating application of liquid photoresist for
PCM"
|
Diethard Kapp-Schwoerer |
| 1998 |
PCMI Meeting, Buergenstock, Switzerland
"A new chromium-free
casein photoresist"
|
Diethard Kapp-Schwoerer |
