HTP has taken on the task of developing specific liquid resists for etching various metals. As a result of this focussed development, and in close cooperation with our customers, products are offered, which are widely recognized by the PCM industry.
Even though the products are fully aqueous processable, they offer higher resolution capabilities and equal adhesion compared to solvent processable materials.
Different resists are also available to address specific requirements in PCM & Photo Engraving.
DiaEtch 100 is a negative working fully aqueous processable etch resist offering an extremely wide processing window. The resist performs on copper alloys as well as steel and stainless steel. Even on polished stainless steel it exhibits exceptional adhesion. In dip-coating applications the resist allows three dimensional objects to be coated.
DiaEtch 539 is a high resolution resist reproducing extremely fine details. Unlike other negative working photoresists this product exhibits no oxygen inhibition allowing it to be successfully processed in very thin layers (e.g. 1μm dry thickness) to provide unsurpassed resolution for etching and electroforming applications.
DiaEtch 765 is an etch resist to manufacture rotogravure cylinders with advanced digital imaging using state of the art laser diode systems (405 nm). This technology allows high definition & multi level etching to manufacture the most detailed and topographic challenging transfer and embossing rollers.
DiaEtch 500 is a positive working etch resist providing outstanding resolution capability as well as high etch resistance. This resist is used to manufacture high end PCM parts in stainless steel such as sieves with challenging hole dimensions as well as providing the capability to photo engrave difficult to etch metals.